DocumentCode :
3555647
Title :
Sealed-interface local oxidation technology
Author :
Hui, J. ; Chiu, T.Y. ; Wong, S. ; Oldham, W.G.
Author_Institution :
University of California, Berkeley, California
Volume :
27
fYear :
1981
fDate :
1981
Firstpage :
706
Lastpage :
706
Keywords :
Argon; Implants; Laboratories; Lead compounds; Oxidation; Stress;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1981 International
Type :
conf
DOI :
10.1109/IEDM.1981.190188
Filename :
1482141
Link To Document :
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