DocumentCode
3555730
Title
Nitrided-oxides for thin gate dielectrics in MOS devices
Author
Grinolds, H.R. ; Wong, S.S. ; Ekstedt, T.W. ; Sodini, C.G. ; Kwan, S.H. ; Jackson, K.H. ; Martinez, L.
Author_Institution
Hewlett-Packard Laboratories, Palo Alto, CA
Volume
28
fYear
1982
fDate
1982
Firstpage
42
Lastpage
45
Keywords
Dielectric devices; Dielectric materials; MOS devices; Plasma applications; Plasma devices; Plasma materials processing; Plasma measurements; Plasma sources; Plasma temperature; Semiconductor films;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1982 International
Type
conf
DOI
10.1109/IEDM.1982.190207
Filename
1482741
Link To Document