Title :
Multi-layer resist systems as a means to submicron optical lithography
Author_Institution :
IBM Thomas J. Watson Research Center, Yorktown Heights, New York
Keywords :
Control systems; Interference; Lithography; Optical imaging; Optical sensors; Particle beam optics; Phase change materials; Resists; Wet etching; X-ray imaging;
Conference_Titel :
Electron Devices Meeting, 1982 International
DOI :
10.1109/IEDM.1982.190306
