• DocumentCode
    3555905
  • Title

    A new VLSI memory cell using capacitance coupling

  • Author

    Terada, K. ; Takada, M. ; Ishijima, T. ; Kurosawa, S. ; Suzuki, S.

  • Author_Institution
    Nippon Electric Co., Ltd., Kawasaki-city, Japan
  • Volume
    28
  • fYear
    1982
  • fDate
    1982
  • Firstpage
    624
  • Lastpage
    627
  • Abstract
    A new VLSI memory cell, which offers small cell area, about 6F2(where F is the feature size), internal cell gain and high alpha-particle immunity is proposed. Since it employs capacitance coupling in a write operation, it requires only one bit line and is called a Capacitance-Coupling (CC) cell. A CC cell consists of three transistors and a capacitor, which are integrated in a small area by sharing their nodes with one another. The charge is stored in a P+-type diffused layer in a shallow N-type diffused layer. The P+-layer potential controls the readout current which flows through the N-layer. Experimental test devices having a 0.7 \\\\mu m deep N-layer and 0.2 \\\\mu m deep P+-layer were fabricated. The complete CC cell operation was confirmed.
  • Keywords
    Capacitors; Coupling circuits; MOSFET circuits; Microelectronics; Parasitic capacitance; Testing; Threshold voltage; Very large scale integration; Voltage control; Writing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1982 International
  • Type

    conf

  • DOI
    10.1109/IEDM.1982.190370
  • Filename
    1482904