• DocumentCode
    3555926
  • Title

    High speed 1 µm CMOS technology

  • Author

    Sakai, I. ; Kudoh, O. ; Yamamoto, H.

  • Author_Institution
    Nippon Electric Co., Ltd., Kanagawa, Japan
  • fYear
    1982
  • fDate
    13-15 Dec. 1982
  • Firstpage
    702
  • Lastpage
    705
  • Abstract
    In order to pursue high speed performance of CMOS logic gates, 1µm CMOS technology has been realized by using advanced process technologies. CMOS logic gate arrays, with minimum feature size of 1.1µm, were prepared, and their operation speed performances were evaluated. Delay times per gate of 0.1 - 0.2 ns have been observed in CMOS logic arrays of 3NAND, 3NOR and F/O=3 INVERTER arrays, of 1.1µm design rule. To realize those logic arrays, 1µm double-well CMOS basic technology has been developed. In this paper, process technology, electrical characteristics of N-channel and P-channel transistors, and device operation characteristics of the CMOS logic arrays, are described.
  • Keywords
    CMOS logic circuits; CMOS process; CMOS technology; Delay; Logic arrays; Logic design; Logic devices; Logic gates; Performance evaluation; Pulse inverters;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1982 International
  • Conference_Location
    San Francisco, CA, USA
  • Type

    conf

  • DOI
    10.1109/IEDM.1982.190391
  • Filename
    1482925