DocumentCode
3555926
Title
High speed 1 µm CMOS technology
Author
Sakai, I. ; Kudoh, O. ; Yamamoto, H.
Author_Institution
Nippon Electric Co., Ltd., Kanagawa, Japan
fYear
1982
fDate
13-15 Dec. 1982
Firstpage
702
Lastpage
705
Abstract
In order to pursue high speed performance of CMOS logic gates, 1µm CMOS technology has been realized by using advanced process technologies. CMOS logic gate arrays, with minimum feature size of 1.1µm, were prepared, and their operation speed performances were evaluated. Delay times per gate of 0.1 - 0.2 ns have been observed in CMOS logic arrays of 3NAND, 3NOR and F/O=3 INVERTER arrays, of 1.1µm design rule. To realize those logic arrays, 1µm double-well CMOS basic technology has been developed. In this paper, process technology, electrical characteristics of N-channel and P-channel transistors, and device operation characteristics of the CMOS logic arrays, are described.
Keywords
CMOS logic circuits; CMOS process; CMOS technology; Delay; Logic arrays; Logic design; Logic devices; Logic gates; Performance evaluation; Pulse inverters;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1982 International
Conference_Location
San Francisco, CA, USA
Type
conf
DOI
10.1109/IEDM.1982.190391
Filename
1482925
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