DocumentCode
3555954
Title
Selectively-doped Al0.48 In0.52 As/Ga0.47 In0.52 As heterostructure transistors
Author
Pearsall, T.P. ; Hendel, R. ; O´Connor, P. ; Alavi, K. ; Cho, A.Y.
Author_Institution
Bell Laboratories, Murray Hill, NJ
Volume
28
fYear
1982
fDate
1982
Firstpage
801
Lastpage
802
Keywords
Carrier confinement; Electron mobility; FET integrated circuits; Fabrication; Integrated circuit technology; Temperature; Transconductance;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1982 International
Type
conf
DOI
10.1109/IEDM.1982.190419
Filename
1482953
Link To Document