• DocumentCode
    3555978
  • Title

    Status and trends of I2L/MTL technology

  • Author

    Wiedmann, Siegfried K.

  • Author_Institution
    IBM Laboratories, Boeblingen/W. Germany
  • Volume
    29
  • fYear
    1983
  • fDate
    1983
  • Firstpage
    47
  • Lastpage
    50
  • Abstract
    The integrated Injection Logic or Merged Transistor Logic (I2L/MTL) techniques have led to attractive VLSI products, such as 16 bit microprocessors with 600 logic gates/mm2of 3 ns delay or 18 k bit static RAM´s of 30 ns access. Even 64 k SRAM´s of 25 ns access are feasible in today´s manufacturing processes. Moreover, recent technology advancements significantly extend the potential of I2L/MTL. Polysilicon self-alignment techniques enable logic circuit delays in the subnanosecond range, and deep-groove dielectric isolation schemes considerably enhance the density and performance of static RAM´s in conjunction with new cell design techniques.
  • Keywords
    Delay; Dielectrics; Flexible printed circuits; Isolation technology; Logic arrays; Logic circuits; Logic devices; Logic gates; Read-write memory; Transistors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1983 International
  • Type

    conf

  • DOI
    10.1109/IEDM.1983.190437
  • Filename
    1483562