• DocumentCode
    3556027
  • Title

    An integrated IC process characterization facility

  • Author

    Scharfetter, D.L. ; Tremain, R.E., Jr. ; Oki, T.J. ; Doganis, K. ; Chen, S.

  • Author_Institution
    Xerox Palo Alto Research Center, Palo Alto, Calif.
  • Volume
    29
  • fYear
    1983
  • fDate
    1983
  • Firstpage
    246
  • Lastpage
    249
  • Abstract
    An IC process characterization facility has been established which is heavily based upon an integrated network environment (Ethernet). This environment represents an instance of what has been referred to as the "factory of the future." The extraction of device parameters suitable for circuit simulation is discussed as one function of such a facility.
  • Keywords
    Circuit simulation; Circuit testing; Databases; Ethernet networks; Libraries; Monitoring; Production facilities; System testing; Test facilities; Threshold voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1983 International
  • Type

    conf

  • DOI
    10.1109/IEDM.1983.190487
  • Filename
    1483612
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3556027