DocumentCode
3556200
Title
Hot carrier degradation mechanism in n-MOSFETS
Author
Hofmann, Karl R. ; Weber, W. ; Werner, C. ; Dorda, G.
Author_Institution
Siemens Research and Technology Laboratories, Princeton, New Jersey
Volume
30
fYear
1984
fDate
1984
Firstpage
104
Lastpage
107
Abstract
Hot carrier degradation experiments are compared to the results of a two-dimensional simulation of hot electron and hole emission into the oxide, taking into account carrier emission which does not lead to gate currents. A new degradation mechanism, due to trapping of electrons on trapped holes, is shown to be the dominant generator of negative effective charge. Hole trapping produces a sharp peak of positive effective charge close to threshold. A simple transistor degradation model based on the calculated carrier emissions gives a very good description of the experimental degradation behavior
Keywords
Charge carrier processes; Current density; Current measurement; Degradation; Electron emission; Electron traps; Hot carriers; Interface states; Lead compounds; MOSFET circuits;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1984 International
Type
conf
DOI
10.1109/IEDM.1984.190653
Filename
1484424
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