• DocumentCode
    3556200
  • Title

    Hot carrier degradation mechanism in n-MOSFETS

  • Author

    Hofmann, Karl R. ; Weber, W. ; Werner, C. ; Dorda, G.

  • Author_Institution
    Siemens Research and Technology Laboratories, Princeton, New Jersey
  • Volume
    30
  • fYear
    1984
  • fDate
    1984
  • Firstpage
    104
  • Lastpage
    107
  • Abstract
    Hot carrier degradation experiments are compared to the results of a two-dimensional simulation of hot electron and hole emission into the oxide, taking into account carrier emission which does not lead to gate currents. A new degradation mechanism, due to trapping of electrons on trapped holes, is shown to be the dominant generator of negative effective charge. Hole trapping produces a sharp peak of positive effective charge close to threshold. A simple transistor degradation model based on the calculated carrier emissions gives a very good description of the experimental degradation behavior
  • Keywords
    Charge carrier processes; Current density; Current measurement; Degradation; Electron emission; Electron traps; Hot carriers; Interface states; Lead compounds; MOSFET circuits;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1984 International
  • Type

    conf

  • DOI
    10.1109/IEDM.1984.190653
  • Filename
    1484424