DocumentCode
3556370
Title
Ion implanted lateral In.2 Ga.8 As/GaAs strained-layer superlattice photodetector
Author
Bulman, G.E. ; Myers, D.R. ; Wiczer, J.J. ; Dawson, L.R. ; Biefeld, R.M. ; Zipperian, T.E.
Author_Institution
Sandia National Laboratories, Albuquerque, New Mexico
Volume
30
fYear
1984
fDate
1984
Firstpage
719
Lastpage
722
Abstract
A Be+implanted lateral In.2 Ga.8 As/GaAs SLS photodetector has been fabricated. The devices exhibit good reverse bias characteristics with dark current of less than 6nA at -60 V. Quantum efficiency measurements indicate an uncoated external value of 50 percent at -20V. Position resolved photocurrent measurements show that carrier collection occurs over a large area (100µm × 250µm at -50V) with capacitance values less than 1 pF. This is the first demonstration of a photodetector which utilizes the preferred direction of conduction that occurs in superlattice structures.
Keywords
Area measurement; Capacitance measurement; Current measurement; Dark current; Gallium arsenide; Laser sintering; Photoconductivity; Photodetectors; Position measurement; Quantum capacitance;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1984 International
Type
conf
DOI
10.1109/IEDM.1984.190825
Filename
1484596
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