Title :
A new degradation mechanism of current drivability and reliability of asymmetrical LDDMOSFET´s
Author :
Mizuno, T. ; Matsumoto, Y. ; Sawada, S. ; Shinozaki, S. ; Ozawa, O.
Author_Institution :
Toshiba Corporation, Kawasaki, Japan
Abstract :
Characteristics of asymmetrical LDDMOSFET´s fabricated by inclined n-ion implantation have been investigated. It has been newly found that current drivability and reliability of asymmetrical LDDMOSFET´s are affected by n-ion incident angle and the gate´s bird´s beak length. Symmetrical and shorter gate´s bird´s beak LDDMOSFET´s are more current drive capable than asymmetrical and longer ones. These results are well explained by our simple model. On the other hand, shorter drain n-- gate overlap and gate´s bird´s beak LDDMOSFET´s are less reliable than longer ones.
Keywords :
Degradation; Ion implantation; Laboratories; MOSFET circuits; Oxidation; Reliability engineering; Semiconductor devices; Substrates; Surface resistance; Very large scale integration;
Conference_Titel :
Electron Devices Meeting, 1985 International
DOI :
10.1109/IEDM.1985.190943