DocumentCode :
3556512
Title :
A model-base comparison: GaAs/GaAlAs HBT versus silicon bipolar
Author :
Kurata, Mamoru ; Katoh, Riichi ; Yoshida, Jiro ; Akagi, Junko
Author_Institution :
Toshiba Corporation, Kawasaki-shi, Japan
Volume :
31
fYear :
1985
fDate :
1985
Firstpage :
306
Lastpage :
309
Abstract :
A pure model-base comparison is made between the GaAs/GaAlAs HBT and the silicon bipolar transistor for the high speed switching performance by utilizing a "physical" one-dimensional transistor model, a hybrid model to represent a real device structure, and our own circuit simulator to allow direct access to the physical model. Delay time versus power characteristics, as well as dynamic carrier profiles are demonstrated, with discussion about limiting factors for the switching speed.
Keywords :
Aluminum; Bipolar transistors; Circuit simulation; Delay effects; Fabrication; Gallium arsenide; Heterojunction bipolar transistors; Research and development; Semiconductor process modeling; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1985 International
Type :
conf
DOI :
10.1109/IEDM.1985.190958
Filename :
1485508
Link To Document :
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