DocumentCode
3556549
Title
a-Si:H TFT array driven linear image sensor with capacitance coupling isolation structure
Author
Ito, H. ; Nishihara, Y. ; Nobue, M. ; Fuse, M. ; Nakamura, T. ; Ozawa, T. ; Tomiyama, S. ; Weisfield, R. ; Tuan, H. ; Thompson, M.
Author_Institution
Fuji Xerox Co., Ltd., Kanagawa, Japan
Volume
31
fYear
1985
fDate
1985
Firstpage
436
Lastpage
439
Abstract
A new linear image sensor integrating a-Si:H photodiode (PD) array, a-Si:H thin film transistor (TFT) array, multiplex circuits and an analog multiplexer on a single substrate has been developed. The photodiode has an Cr/a-Si:H/ITO sandwich structure. A photo to dark current ratio is 104under 100 Ix green fluorescent lamp illumination. The TFT has an inverted staggered structure and SiNx is used as a gate insulator. ON-current is 2 µA and ON/OFF ratio is 106(W/L = 4). In order to prevent capacitance couplings between data lines, the sensor has a ground line between each data line and ground metal layer between the bottom and upper conductive layer. The output voltage of the sensor is 43 mV at the exposure of 0.5 Ix.s and has uniformity better than ± 15%.
Keywords
Capacitance; Chromium; Coupling circuits; Image sensors; Indium tin oxide; Multiplexing; Photodiodes; Sensor arrays; Substrates; Thin film transistors;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1985 International
Type
conf
DOI
10.1109/IEDM.1985.190995
Filename
1485545
Link To Document