• DocumentCode
    3556549
  • Title

    a-Si:H TFT array driven linear image sensor with capacitance coupling isolation structure

  • Author

    Ito, H. ; Nishihara, Y. ; Nobue, M. ; Fuse, M. ; Nakamura, T. ; Ozawa, T. ; Tomiyama, S. ; Weisfield, R. ; Tuan, H. ; Thompson, M.

  • Author_Institution
    Fuji Xerox Co., Ltd., Kanagawa, Japan
  • Volume
    31
  • fYear
    1985
  • fDate
    1985
  • Firstpage
    436
  • Lastpage
    439
  • Abstract
    A new linear image sensor integrating a-Si:H photodiode (PD) array, a-Si:H thin film transistor (TFT) array, multiplex circuits and an analog multiplexer on a single substrate has been developed. The photodiode has an Cr/a-Si:H/ITO sandwich structure. A photo to dark current ratio is 104under 100 Ix green fluorescent lamp illumination. The TFT has an inverted staggered structure and SiNx is used as a gate insulator. ON-current is 2 µA and ON/OFF ratio is 106(W/L = 4). In order to prevent capacitance couplings between data lines, the sensor has a ground line between each data line and ground metal layer between the bottom and upper conductive layer. The output voltage of the sensor is 43 mV at the exposure of 0.5 Ix.s and has uniformity better than ± 15%.
  • Keywords
    Capacitance; Chromium; Coupling circuits; Image sensors; Indium tin oxide; Multiplexing; Photodiodes; Sensor arrays; Substrates; Thin film transistors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1985 International
  • Type

    conf

  • DOI
    10.1109/IEDM.1985.190995
  • Filename
    1485545