DocumentCode :
3556549
Title :
a-Si:H TFT array driven linear image sensor with capacitance coupling isolation structure
Author :
Ito, H. ; Nishihara, Y. ; Nobue, M. ; Fuse, M. ; Nakamura, T. ; Ozawa, T. ; Tomiyama, S. ; Weisfield, R. ; Tuan, H. ; Thompson, M.
Author_Institution :
Fuji Xerox Co., Ltd., Kanagawa, Japan
Volume :
31
fYear :
1985
fDate :
1985
Firstpage :
436
Lastpage :
439
Abstract :
A new linear image sensor integrating a-Si:H photodiode (PD) array, a-Si:H thin film transistor (TFT) array, multiplex circuits and an analog multiplexer on a single substrate has been developed. The photodiode has an Cr/a-Si:H/ITO sandwich structure. A photo to dark current ratio is 104under 100 Ix green fluorescent lamp illumination. The TFT has an inverted staggered structure and SiNx is used as a gate insulator. ON-current is 2 µA and ON/OFF ratio is 106(W/L = 4). In order to prevent capacitance couplings between data lines, the sensor has a ground line between each data line and ground metal layer between the bottom and upper conductive layer. The output voltage of the sensor is 43 mV at the exposure of 0.5 Ix.s and has uniformity better than ± 15%.
Keywords :
Capacitance; Chromium; Coupling circuits; Image sensors; Indium tin oxide; Multiplexing; Photodiodes; Sensor arrays; Substrates; Thin film transistors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1985 International
Type :
conf
DOI :
10.1109/IEDM.1985.190995
Filename :
1485545
Link To Document :
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