• DocumentCode
    3556565
  • Title

    Analysis of LDD transistor asymmetry susceptibility in VLSI circuits

  • Author

    Oowaki, Y. ; Itoh, Y. ; Momodomi, M. ; Horiguchi, F. ; Watanabe, S. ; Ogura, M. ; Nishimura, H.

  • Author_Institution
    TOSHIBA Corporation, Kawasaki, Japan
  • Volume
    31
  • fYear
    1985
  • fDate
    1985
  • Firstpage
    492
  • Lastpage
    495
  • Abstract
    This paper describes problems due to asymmetry of source and drain impurity profile caused by the shadowing of ion beams by gate electrodes. This asymmetry degrades the sensitivity of sense amplifiers especially when Lightly-Doped-Drain/Source (LDD) transistors are adopted. This effect is a serious obstacle to realize ultra high density DRAM´s. In order to reduce this effect, a sensing circuit suppressing the asymmetry effect is proposed and its sensitivity improvement is evaluated.
  • Keywords
    Analytical models; Degradation; Driver circuits; Electrodes; Implants; Impurities; Random access memory; Transconductance; Very large scale integration; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1985 International
  • Type

    conf

  • DOI
    10.1109/IEDM.1985.191011
  • Filename
    1485561