Title :
Analysis of LDD transistor asymmetry susceptibility in VLSI circuits
Author :
Oowaki, Y. ; Itoh, Y. ; Momodomi, M. ; Horiguchi, F. ; Watanabe, S. ; Ogura, M. ; Nishimura, H.
Author_Institution :
TOSHIBA Corporation, Kawasaki, Japan
Abstract :
This paper describes problems due to asymmetry of source and drain impurity profile caused by the shadowing of ion beams by gate electrodes. This asymmetry degrades the sensitivity of sense amplifiers especially when Lightly-Doped-Drain/Source (LDD) transistors are adopted. This effect is a serious obstacle to realize ultra high density DRAM´s. In order to reduce this effect, a sensing circuit suppressing the asymmetry effect is proposed and its sensitivity improvement is evaluated.
Keywords :
Analytical models; Degradation; Driver circuits; Electrodes; Implants; Impurities; Random access memory; Transconductance; Very large scale integration; Voltage;
Conference_Titel :
Electron Devices Meeting, 1985 International
DOI :
10.1109/IEDM.1985.191011