DocumentCode
3556565
Title
Analysis of LDD transistor asymmetry susceptibility in VLSI circuits
Author
Oowaki, Y. ; Itoh, Y. ; Momodomi, M. ; Horiguchi, F. ; Watanabe, S. ; Ogura, M. ; Nishimura, H.
Author_Institution
TOSHIBA Corporation, Kawasaki, Japan
Volume
31
fYear
1985
fDate
1985
Firstpage
492
Lastpage
495
Abstract
This paper describes problems due to asymmetry of source and drain impurity profile caused by the shadowing of ion beams by gate electrodes. This asymmetry degrades the sensitivity of sense amplifiers especially when Lightly-Doped-Drain/Source (LDD) transistors are adopted. This effect is a serious obstacle to realize ultra high density DRAM´s. In order to reduce this effect, a sensing circuit suppressing the asymmetry effect is proposed and its sensitivity improvement is evaluated.
Keywords
Analytical models; Degradation; Driver circuits; Electrodes; Implants; Impurities; Random access memory; Transconductance; Very large scale integration; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1985 International
Type
conf
DOI
10.1109/IEDM.1985.191011
Filename
1485561
Link To Document