• DocumentCode
    3556636
  • Title

    Comparison of lateral and vertical DMOS specific on-resistance

  • Author

    Amato, Michael ; Rumennik, Vladimir

  • Author_Institution
    North American Philips Corporation, Briarcliff Manor, New York
  • Volume
    31
  • fYear
    1985
  • fDate
    1985
  • Firstpage
    736
  • Lastpage
    739
  • Abstract
    The specific on-resistance characteristics of the lateral and vertical DMOS transistors are compared for voltages between 50 and 800 volts. The vertical DMOS transistor´s breakdown and on-resistance relationship is reviewed, followed by modeling results of the lateral DMOS transistor´s breakdown and on-resistance characteristics. A direct comparison is then made between the vertical and lateral devices. The results indicate that the vertical device has lower specific on-resistance at low voltages because of its higher channel width/unit chip area packing. At higher voltages, the lateral device becomes equal to or better than the vertical device because of its ability to maintain a high drift region conductivity.
  • Keywords
    Conductivity; Electric breakdown; Electrodes; Frequency; Geometry; Integrated circuit yield; Laboratories; Low voltage; Power integrated circuits; Voltage control;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1985 International
  • Type

    conf

  • DOI
    10.1109/IEDM.1985.191081
  • Filename
    1485631