DocumentCode
3556636
Title
Comparison of lateral and vertical DMOS specific on-resistance
Author
Amato, Michael ; Rumennik, Vladimir
Author_Institution
North American Philips Corporation, Briarcliff Manor, New York
Volume
31
fYear
1985
fDate
1985
Firstpage
736
Lastpage
739
Abstract
The specific on-resistance characteristics of the lateral and vertical DMOS transistors are compared for voltages between 50 and 800 volts. The vertical DMOS transistor´s breakdown and on-resistance relationship is reviewed, followed by modeling results of the lateral DMOS transistor´s breakdown and on-resistance characteristics. A direct comparison is then made between the vertical and lateral devices. The results indicate that the vertical device has lower specific on-resistance at low voltages because of its higher channel width/unit chip area packing. At higher voltages, the lateral device becomes equal to or better than the vertical device because of its ability to maintain a high drift region conductivity.
Keywords
Conductivity; Electric breakdown; Electrodes; Frequency; Geometry; Integrated circuit yield; Laboratories; Low voltage; Power integrated circuits; Voltage control;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1985 International
Type
conf
DOI
10.1109/IEDM.1985.191081
Filename
1485631
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