Title : 
Minority carrier transport in silicon
         
        
            Author : 
Tang, D.D. ; Fang, F.F. ; Scheuermann, M. ; Chen, T.C. ; Sai-Halasz, G.
         
        
            Author_Institution : 
IBM T.J. Watson Research Center, Yorktown Heights, NY
         
        
        
        
        
        
        
            Abstract : 
Time-of-flight measurements of the minority-carrier electron drift mobility in p-type silicon at room temperature are presented. It was found that the electron mobility at zero field is close to that in n-type silicon of equivalent doping density, however, it decreases rapidly with electric field in a range from 0 - 200 V/cm and more gradually at higher fields. This effect is attributed to electron-hole scattering.
         
        
            Keywords : 
Aluminum; Current measurement; Electron mobility; Measurement techniques; Optical pulse generation; Pulse amplifiers; Semiconductor device doping; Silicon; Space vector pulse width modulation; Voltage;
         
        
        
        
            Conference_Titel : 
Electron Devices Meeting, 1986 International
         
        
        
            DOI : 
10.1109/IEDM.1986.191100