Title :
Majority and minority carrier transport in polysilicon emitter contacts
Author :
Crabbé, E. ; Swirhun, S. ; Alamo, J. Del ; Pease, R.F.W. ; Swanson, R.M.
Author_Institution :
Stanford University, Stanford, California
Abstract :
The minority hole transport in polysilicon emitter contacts has been studied with a novel pnp test transistor. Segregated arsenic at the polysilicon/silicon interface is mostly responsible for the base current reduction in polysilicon-contacted npn transistors. This improvement comes at a price of a higher emitter resistance. This resistance was measured with a Kelvin resistor structure and the base current/ emitter resistance trade-off is quantified.
Keywords :
Boron; Current measurement; Electrical resistance measurement; Electronic equipment testing; Kelvin; Laboratories; P-n junctions; Rapid thermal annealing; Silicon; Solid state circuits;
Conference_Titel :
Electron Devices Meeting, 1986 International
DOI :
10.1109/IEDM.1986.191102