DocumentCode :
3556666
Title :
Majority and minority carrier transport in polysilicon emitter contacts
Author :
Crabbé, E. ; Swirhun, S. ; Alamo, J. Del ; Pease, R.F.W. ; Swanson, R.M.
Author_Institution :
Stanford University, Stanford, California
Volume :
32
fYear :
1986
fDate :
1986
Firstpage :
28
Lastpage :
31
Abstract :
The minority hole transport in polysilicon emitter contacts has been studied with a novel pnp test transistor. Segregated arsenic at the polysilicon/silicon interface is mostly responsible for the base current reduction in polysilicon-contacted npn transistors. This improvement comes at a price of a higher emitter resistance. This resistance was measured with a Kelvin resistor structure and the base current/ emitter resistance trade-off is quantified.
Keywords :
Boron; Current measurement; Electrical resistance measurement; Electronic equipment testing; Kelvin; Laboratories; P-n junctions; Rapid thermal annealing; Silicon; Solid state circuits;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1986 International
Type :
conf
DOI :
10.1109/IEDM.1986.191102
Filename :
1486360
Link To Document :
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