DocumentCode :
3556742
Title :
The effects of weak gate-to-drain(source) overlap on MOSFET characteristics
Author :
Ko, P.K. ; Chan, T.Y. ; Wu, A.T. ; Hu, C.
Author_Institution :
University of California, Berkeley, CA
Volume :
32
fYear :
1986
fDate :
1986
Firstpage :
292
Lastpage :
295
Abstract :
Recent studies showed that minor structural differences in the gate-to-drain (source) overlap of a MOSFET has unexpectedly strong influence on its characteristics. As the overlap is weakened, the drain drive degrades, the substrate and gate currents show abnormal behaviors, and the device lifetime suffers. A simple physical model is presented that adequately explains most of these observed high-field effects, including the asymmetry in device properties. Implications of the wear-overlap phenomena on future process and device designs are discussed.
Keywords :
Degradation; EPROM; Ice; Implants; Intrusion detection; Ion implantation; MOSFET circuits; Process control; Process design; Space technology;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1986 International
Type :
conf
DOI :
10.1109/IEDM.1986.191173
Filename :
1486431
Link To Document :
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