DocumentCode :
3556773
Title :
Power supply voltage for future CMOS VLSI in half and sub micrometer
Author :
Kakumu, Masakazu ; Kinugawa, Masaaki ; Hashimoto, Kazuhiko ; Matsunaga, Junichi
Author_Institution :
Toshiba Corporation, Kawasaki, Japan
Volume :
32
fYear :
1986
fDate :
1986
Firstpage :
399
Lastpage :
402
Abstract :
The trade off between circuit performance and reliability of CMOS devices is theoretically and experimentally examined in detail down to sub micrometer gate length including various effects such as mobility degradation, reliability physics, parasitic capacitances and parasitic resistances. Based upon these cosideration, a new scaling scenario has been proposed to determine power supply voltage for half and lower sub micrometer CMOS devices. The new scaling scheme has been applied to O.6um CMOS device and it has been verified that the power supply voltage can be scaled down maintaining high circuit performance with high reliability.
Keywords :
Circuit optimization; Circuit simulation; Degradation; Maintenance; Parasitic capacitance; Power supplies; Reliability theory; Semiconductor device reliability; Very large scale integration; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1986 International
Type :
conf
DOI :
10.1109/IEDM.1986.191202
Filename :
1486460
Link To Document :
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