DocumentCode :
3556842
Title :
Near single carrier-type multiplication in a multiple graded-well structure for a solid-state photomultiplier
Author :
Allam, J. ; Capasso, F. ; Alavi, K. ; Cho, A.Y.
Author_Institution :
University of Surrey, Surrey, England
Volume :
32
fYear :
1986
fDate :
1986
Firstpage :
614
Lastpage :
617
Abstract :
We report the observation of very large ionization rate ratios (β/α) in multiple graded-well Al0.48In0.52As/Ga0.47In0.53As avalanche photodiodes, grown by MBE. Avalanche multiplication occurs when holes heated by the field in the barrier layers impact ionize thermally-generated holes dynamically stored in the wells over the valence band-edge discontinuity. Since electrons are not confined in the graded structure, there is no multiplication of electrons by this process. This is the first observation of near single carrier-type multiplication in a III-V material.
Keywords :
Charge carrier processes; Electric breakdown; Gold; Ionization; Photoconductivity; Photomultipliers; Solid state circuits; Superlattices; Temperature; Tin;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1986 International
Type :
conf
DOI :
10.1109/IEDM.1986.191265
Filename :
1486523
Link To Document :
بازگشت