DocumentCode :
3556887
Title :
High-power high-efficiency stable indium phosphide MISFETs
Author :
Messick, L. ; Collins, D.A. ; Nguyen, R. ; Clawson, A.R. ; McWilliams, G.E.
Author_Institution :
Naval Ocean Systems, San Diego, CA
Volume :
32
fYear :
1986
fDate :
1986
Firstpage :
767
Lastpage :
770
Abstract :
In P MISFETs with gate widths up to 1 mm using SiO2as the gate insulator have been fabricated. At 9.7 GHz the highest power output with 4 dB gain was 4.5 W at 46% power-added efficiency corresponding to a power density of 4.5 W/mm of gate width. The maximum power-added efficiency for the same device and frequency was 50% at 3.8 W and 3.8 dB gain. This power is more than 3.5 times the previously reported maximum for InP FETs at 15% higher power-added efficiency and the power per unit gate width is more than three times that of the best GaAs FET. Power output was stable to within 2% over 167 hours of continuous operation.
Keywords :
Conducting materials; FETs; Gain; Gallium arsenide; Indium phosphide; Insulation; Leakage current; MESFETs; MISFETs; Microwave devices;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1986 International
Type :
conf
DOI :
10.1109/IEDM.1986.191307
Filename :
1486565
Link To Document :
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