DocumentCode
3557018
Title
On the narrow-emitter effect of advanced shallow profile bipolar transistors
Author
Li, G.P. ; Chuang, C.T. ; Chen, T.C. ; Ning, T.H.
Author_Institution
IBM Thomas J. Watson Research Center, Yorktown Heights, New York
Volume
33
fYear
1987
fDate
1987
Firstpage
174
Lastpage
177
Abstract
This paper presents a detailed study on the narrow-emitter effect of advanced shallow-profile bipolar transistors. The physical mechanisms behind both the base current and collector current modifications caused by the lateral encroachment of the extrinsic base are investigated. It is shown that in addition to a reduction in the active device area due to the lateral encroachment of extrinsic base into the intrinsic base area, the emitter polysilicon-single crystal interface (bulk property of the polysilicon emitter) and the junction curvature of the emitter/extrinsic-base intercept (perimeter property) also play important roles in determining the current gain for narrow emitter bipolar transistors. The implications on the device and process design for future scaled-down devices are discussed.
Keywords
Bipolar integrated circuits; Bipolar transistors; Cutoff frequency; Degradation; Design optimization; Integrated circuit technology; MOSFETs; Process design;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1987 International
Type
conf
DOI
10.1109/IEDM.1987.191380
Filename
1487338
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