• DocumentCode
    3557018
  • Title

    On the narrow-emitter effect of advanced shallow profile bipolar transistors

  • Author

    Li, G.P. ; Chuang, C.T. ; Chen, T.C. ; Ning, T.H.

  • Author_Institution
    IBM Thomas J. Watson Research Center, Yorktown Heights, New York
  • Volume
    33
  • fYear
    1987
  • fDate
    1987
  • Firstpage
    174
  • Lastpage
    177
  • Abstract
    This paper presents a detailed study on the narrow-emitter effect of advanced shallow-profile bipolar transistors. The physical mechanisms behind both the base current and collector current modifications caused by the lateral encroachment of the extrinsic base are investigated. It is shown that in addition to a reduction in the active device area due to the lateral encroachment of extrinsic base into the intrinsic base area, the emitter polysilicon-single crystal interface (bulk property of the polysilicon emitter) and the junction curvature of the emitter/extrinsic-base intercept (perimeter property) also play important roles in determining the current gain for narrow emitter bipolar transistors. The implications on the device and process design for future scaled-down devices are discussed.
  • Keywords
    Bipolar integrated circuits; Bipolar transistors; Cutoff frequency; Degradation; Design optimization; Integrated circuit technology; MOSFETs; Process design;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1987 International
  • Type

    conf

  • DOI
    10.1109/IEDM.1987.191380
  • Filename
    1487338