Title :
Process diagnostic and fluctuation analysis using a two-dimensional simulation system with a new linearized iteration method
Author :
Onga, Shinji ; Wada, Tetsunori
Author_Institution :
Toshiba Corporation, Kawasaki, Japan
Abstract :
In this paper, we present, (i) a general concept of the simulation system, (ii) algorithm of process fluctuation analysis, and (iii) inference engine of AI software package and demonstrate typical evidences of execution results, and also discuss a capability of "reverse-way" simulation system which could optimize process starting from definite requirements of device characteristics.
Keywords :
Analytical models; Artificial intelligence; CMOS process; Engines; Fluctuations; Frequency; Impurities; Lithography; Sensitivity analysis; Very large scale integration;
Conference_Titel :
Electron Devices Meeting, 1987 International
DOI :
10.1109/IEDM.1987.191406
