DocumentCode :
3557086
Title :
Optimization of bipolar transistors for low temperature operation
Author :
Woo, J.C.S. ; Plummer, James D.
Author_Institution :
Stanford University, Stanford, CA
Volume :
33
fYear :
1987
fDate :
1987
Firstpage :
401
Lastpage :
404
Abstract :
Most bipolar transistors designed for room temperature operation suffer serious current gain degradation at liquid nitrogen temperature. This is mainly due to bandgap narrowing in the heavily doped emitter. Switching performance also suffers because of carrier freezeout at lower temperatures. In this paper, bipolar transistors designed specifically for operation at liquid nitrogen temperature are discussed. It is concluded that for high gain, high performance LN2bipolar transistors, the emitter concentration should be around 5 × 1018cm-3. Compensating impurities in the base should be kept to minimum. Test bipolar transistors with polysilicon emitter contacts were fabricated using these criteria. The devices show very little current degradation between room temperature and 77K. Polysilicon emitter contacts are also shown to be somewhat more effective at lower temperatures.
Keywords :
BiCMOS integrated circuits; Bipolar transistors; Degradation; Doping; Laboratories; Neodymium; Nitrogen; Performance gain; Photonic band gap; Temperature;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1987 International
Type :
conf
DOI :
10.1109/IEDM.1987.191442
Filename :
1487400
Link To Document :
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