DocumentCode
3557086
Title
Optimization of bipolar transistors for low temperature operation
Author
Woo, J.C.S. ; Plummer, James D.
Author_Institution
Stanford University, Stanford, CA
Volume
33
fYear
1987
fDate
1987
Firstpage
401
Lastpage
404
Abstract
Most bipolar transistors designed for room temperature operation suffer serious current gain degradation at liquid nitrogen temperature. This is mainly due to bandgap narrowing in the heavily doped emitter. Switching performance also suffers because of carrier freezeout at lower temperatures. In this paper, bipolar transistors designed specifically for operation at liquid nitrogen temperature are discussed. It is concluded that for high gain, high performance LN2 bipolar transistors, the emitter concentration should be around 5 × 1018cm-3. Compensating impurities in the base should be kept to minimum. Test bipolar transistors with polysilicon emitter contacts were fabricated using these criteria. The devices show very little current degradation between room temperature and 77K. Polysilicon emitter contacts are also shown to be somewhat more effective at lower temperatures.
Keywords
BiCMOS integrated circuits; Bipolar transistors; Degradation; Doping; Laboratories; Neodymium; Nitrogen; Performance gain; Photonic band gap; Temperature;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1987 International
Type
conf
DOI
10.1109/IEDM.1987.191442
Filename
1487400
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