• DocumentCode
    3557086
  • Title

    Optimization of bipolar transistors for low temperature operation

  • Author

    Woo, J.C.S. ; Plummer, James D.

  • Author_Institution
    Stanford University, Stanford, CA
  • Volume
    33
  • fYear
    1987
  • fDate
    1987
  • Firstpage
    401
  • Lastpage
    404
  • Abstract
    Most bipolar transistors designed for room temperature operation suffer serious current gain degradation at liquid nitrogen temperature. This is mainly due to bandgap narrowing in the heavily doped emitter. Switching performance also suffers because of carrier freezeout at lower temperatures. In this paper, bipolar transistors designed specifically for operation at liquid nitrogen temperature are discussed. It is concluded that for high gain, high performance LN2bipolar transistors, the emitter concentration should be around 5 × 1018cm-3. Compensating impurities in the base should be kept to minimum. Test bipolar transistors with polysilicon emitter contacts were fabricated using these criteria. The devices show very little current degradation between room temperature and 77K. Polysilicon emitter contacts are also shown to be somewhat more effective at lower temperatures.
  • Keywords
    BiCMOS integrated circuits; Bipolar transistors; Degradation; Doping; Laboratories; Neodymium; Nitrogen; Performance gain; Photonic band gap; Temperature;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1987 International
  • Type

    conf

  • DOI
    10.1109/IEDM.1987.191442
  • Filename
    1487400