• DocumentCode
    3557159
  • Title

    A large area MOS-GTO with wafer-repair technique

  • Author

    Stoisiek, M. ; Beyer, M. ; Kiffe, W. ; Schultz, H.-J. ; Schmid, H. ; Schwarzbauer, H. ; Stengl, R. ; Turkes, P. ; Theis, D.

  • Author_Institution
    Siemens AG, München, West Germany
  • Volume
    33
  • fYear
    1987
  • fDate
    1987
  • Firstpage
    666
  • Lastpage
    669
  • Abstract
    Turn-off thyristors with MOS-controlled emitter-base shorts (MOS-GTOs) are fabricated by using IC technology. Therefore, the device area is limited to about 1 cm2. However, typical power devices for currents >100 amps need to have areas well above this value. We now succeeded in realizing a MOS-GTO of 3 cm diameter by applying a laboratory type wafer repair technique. Processing failures, like shorts of some kind, are treated in a way which keeps this failures electrical inactive. These devices are comparable to conventional thyristors in their on-state and blocking behaviour. Turn-off currents of about 700 amps can be achieved at low anode-voltages. However, at high anode-voltages the turnoff ability is limited by avalanche injection phenomena.
  • Keywords
    Contacts; Current density; Current measurement; Density measurement; Fabrication; Laboratories; Manufacturing processes; Semiconductor device measurement; Thyristors; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1987 International
  • Type

    conf

  • DOI
    10.1109/IEDM.1987.191516
  • Filename
    1487474