DocumentCode
3557191
Title
LDMOS and LIGT´s in CMOS technology for power integrated circuits
Author
Mukherjee, Satyen ; Amato, Mike ; Wacyk, I. ; Rumennik, Viadimir
Author_Institution
North American Philips Corporation, Briarcliff Manor, NY, USA
Volume
33
fYear
1987
fDate
1987
Firstpage
778
Lastpage
781
Abstract
In MOS Power Integrated Circuits, the Lateral Double Diffused MOS Transistor (LDMOS) has been used as a power device because of its ease of integration with CMOS circuitry. In this paper, two versions of a Switched Mode Power Supply chip are described using Lateral Insulated Gate Transistor (LIGT) in one and LDMOS in the other. The LIGT version results in substantial reduction of die size for the same functionality because of the reduced specific on-resistance of the LIGT in comparison with LDMOS. An-type epitaxial layer process and RESURF concept has been used to implement the two high voltage designs with CMOS control circuitry.
Keywords
Anodes; CMOS process; CMOS technology; Conductivity; Epitaxial layers; Insulation; Integrated circuit technology; MOSFETs; Power integrated circuits; Switched-mode power supply;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1987 International
Type
conf
DOI
10.1109/IEDM.1987.191547
Filename
1487505
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