• DocumentCode
    3557191
  • Title

    LDMOS and LIGT´s in CMOS technology for power integrated circuits

  • Author

    Mukherjee, Satyen ; Amato, Mike ; Wacyk, I. ; Rumennik, Viadimir

  • Author_Institution
    North American Philips Corporation, Briarcliff Manor, NY, USA
  • Volume
    33
  • fYear
    1987
  • fDate
    1987
  • Firstpage
    778
  • Lastpage
    781
  • Abstract
    In MOS Power Integrated Circuits, the Lateral Double Diffused MOS Transistor (LDMOS) has been used as a power device because of its ease of integration with CMOS circuitry. In this paper, two versions of a Switched Mode Power Supply chip are described using Lateral Insulated Gate Transistor (LIGT) in one and LDMOS in the other. The LIGT version results in substantial reduction of die size for the same functionality because of the reduced specific on-resistance of the LIGT in comparison with LDMOS. An-type epitaxial layer process and RESURF concept has been used to implement the two high voltage designs with CMOS control circuitry.
  • Keywords
    Anodes; CMOS process; CMOS technology; Conductivity; Epitaxial layers; Insulation; Integrated circuit technology; MOSFETs; Power integrated circuits; Switched-mode power supply;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1987 International
  • Type

    conf

  • DOI
    10.1109/IEDM.1987.191547
  • Filename
    1487505