DocumentCode :
3557194
Title :
720-780 nm AlGaAs/GaAs DFB lasers with InGaAsP waveguiding layers
Author :
Takiguchi, H. ; Kudo, H. ; Kaneiwa, S. ; Sakane, C. ; Hijikata, T.
Author_Institution :
Sharp Corp. Central Res. Labs., Japan
Volume :
33
fYear :
1987
fDate :
1987
Firstpage :
788
Lastpage :
791
Abstract :
Distributed-feedback AlGaAs lasers of 720-780 nm emmision wavelength with GaAs lattice matched InGaAsP waveguide layers are fabricated. The LOC structure is grown on GaAs substrate by liquid phase epitaxy, and the laser diode fabrication is the same as the V-channeled substrate inner stripe lasers. They operate in a single-longitudinal -mode during temperature range of 40 °C. The threshold current as low as 145 mA for 720 nm and 120 mA for 780 nm are obtained under cw operation at room temperature.
Keywords :
Diode lasers; Epitaxial growth; Gallium arsenide; Lab-on-a-chip; Lattices; Optical device fabrication; Substrates; Temperature distribution; Threshold current; Waveguide lasers;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1987 International
Type :
conf
DOI :
10.1109/IEDM.1987.191550
Filename :
1487508
Link To Document :
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