• DocumentCode
    3557210
  • Title

    Increased degradation of half-micron PMOSFETs due to swapped pulse stressing

  • Author

    Koyanagi, M. ; Lewis, A. ; Martin, R. ; Huang, T. ; Chen, J.

  • Author_Institution
    Xerox, Palo Alto Research Center, Palo Alto, CA
  • Volume
    33
  • fYear
    1987
  • fDate
    1987
  • Firstpage
    844
  • Lastpage
    847
  • Keywords
    CMOS technology; Degradation; Electrons; Implants; Laboratories; MOSFETs; Pulse circuits; Pulse measurements; Stress measurement; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1987 International
  • Type

    conf

  • DOI
    10.1109/IEDM.1987.191565
  • Filename
    1487523