DocumentCode :
3557407
Title :
Impact of the back gate effect on bipolar junction transistors in smart power SOI technologies
Author :
Schwantes, Stefan ; Graf, Michael ; Dudek, Volker
Author_Institution :
ATMEL Germany, Heilbronn, Germany
fYear :
2005
fDate :
23-26 May 2005
Firstpage :
107
Lastpage :
110
Abstract :
This work investigates the effect of the back gate electrode on bipolar junction transistors (BJTs) in smart power SOI technologies. The impact on the BJT is discussed by means of measurements and device simulations. It is shown that proper back gate biasing results in a significant performance improvement for either the NPN or the PNP transistor. A design strategy is presented that offers an optimized utilization of the back gate effect.
Keywords :
circuit optimisation; circuit simulation; power bipolar transistors; silicon-on-insulator; NPN/PNP transistor; back gate effect; back gate electrode; bipolar junction transistors; design strategy; device simulations; smart power SOI technologies; Avalanche breakdown; Clamps; Electric breakdown; Electrodes; Impact ionization; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Power Semiconductor Devices and ICs, 2005. Proceedings. ISPSD '05. The 17th International Symposium on
Print_ISBN :
0-7803-8890-9
Type :
conf
DOI :
10.1109/ISPSD.2005.1487962
Filename :
1487962
Link To Document :
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