Title :
1.5kV Novel 4H-SiC Lateral Channel (LC) JBS Rectifiers with Low Leakage Current and Capacitance
Author :
Zhu, Lin ; Li, Canhua ; Chow, T. Paul ; Bhat, Ishwara B. ; Jones, Kenneth A. ; Scozzie, C. ; Agarwal, Anant
Author_Institution :
Center for Integrated Electron., Rensselaer Polytech. Inst., Troy, NY
Abstract :
We propose and experimentally demonstrate a novel 1.5kV JBS rectifier structure called LC-JBS rectifier that offers a lower reverse leakage current and faster switching speed. Test devices were fabricated using an epi regrowth technology over implanted p+ buried layer. We have obtained performance trade-offs between forward drop (<1.8V) with reverse leakage characteristics approaching that of PiN rectifiers, together with ~50% reduction of junction capacitance for LC-JBS rectifiers when compared to conventional Schottky rectifiers
Keywords :
Schottky diodes; epitaxial growth; ion implantation; leakage currents; power semiconductor diodes; semiconductor doping; silicon compounds; solid-state rectifiers; wide band gap semiconductors; 1.5 kV; 4H-SiC lateral channel JBS rectifiers; LC-JBS rectifiers; Schottky rectifiers; SiC; epi regrowth technology; forward drop; ion implantation; junction capacitance reduction; reverse leakage current; Capacitance; Doping; Leakage current; Rectifiers; Schottky barriers; Silicon carbide; Surface resistance; Temperature; Testing; Voltage;
Conference_Titel :
Power Semiconductor Devices and ICs, 2005. Proceedings. ISPSD '05. The 17th International Symposium on
Conference_Location :
Santa Barbara, CA
Print_ISBN :
0-7803-8890-9
DOI :
10.1109/ISPSD.2005.1488006