DocumentCode :
3557472
Title :
Switching loss optimization of 20V devices integrated in a 0.13 μm CMOS technology for portable applications
Author :
Grelu, C. ; Baboux, N. ; Bianchi, R.A. ; Plossu, C.
Author_Institution :
STMicroelectronics, Crolles
fYear :
2005
fDate :
23-26 May 2005
Firstpage :
339
Lastpage :
342
Abstract :
Switching performances of low-cost 20V drift-MOSFETs and diffused-MOSFETs power devices are compared. Thanks to a new dynamic gate capacitance measurement protocol, the average gate capacitance responsible for power losses during fast switching transitions is estimated and the Miller effect contribution is quantified. Optimized drift-MOSFETs with reduced gate length and gate to drain overlap present comparable and even better performances than diffused-MOSFETs. Moreover they present the lowest process over-cost, making them excellent and very competitive candidates for low-cost portable power management applications
Keywords :
optimisation; power MOSFET; 0.13 micron; 20 V; CMOS technology; MOSFET optimization; Miller effect contribution; diffused-MOSFET; drift-MOSFET; dynamic gate capacitance measurement protocol; portable applications; power MOSFET; switching loss optimization; CMOS technology; Capacitance measurement; Doping; Energy management; Performance evaluation; Protocols; Semiconductor device modeling; Switching loss; Technology management; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Power Semiconductor Devices and ICs, 2005. Proceedings. ISPSD '05. The 17th International Symposium on
Conference_Location :
Santa Barbara, CA
Print_ISBN :
0-7803-8890-9
Type :
conf
DOI :
10.1109/ISPSD.2005.1488020
Filename :
1488020
Link To Document :
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