Title :
Real time spectroscopic ellipsometry of thin film CdTe deposition by magnetron sputtering for photovoltaic applications
Author :
Zapien, J.A. ; Chen, Jie ; Li, Jian ; Inks, J. ; Podraza, N.J. ; Chen, Chi ; Drayton, J. ; Vasko, A. ; Gupta, A. ; Wang, S.L. ; Collins, R.W. ; Compaan, A.D.
Author_Institution :
City Univ. of Hong Kong, Kowloon, China
Abstract :
Real time spectroscopic ellipsometry based on rotating-compensator modulation and multichannel detection has been implemented to characterize CdTe deposition for polycrystalline thin film photovoltaic applications. The CdTe film measured and analyzed in detail in this study was prepared by magnetron sputtering onto a native oxide-covered crystalline silicon substrate. Key observations from this study include: (i) monolayer-level surface roughness thickness (∼3 Å) at the onset of bulk layer formation and during subsequent growth to ∼50 Å; (ii) gradual development of a lower density bulk layer after ∼13000 Å of CdTe thickness; and (iii) much broader above-gap critical points in the dielectric function for thin film polycrystalline CdTe compared to the single crystal.
Keywords :
II-VI semiconductors; cadmium compounds; density; dielectric function; ellipsometry; energy gap; photovoltaic effects; semiconductor growth; semiconductor thin films; sputter deposition; surface roughness; CdTe; Si-SiO2; above-gap critical points; bulk layer formation; dielectric function; magnetron sputtering; monolayer-level surface roughness thickness; multichannel detection; native oxide-covered crystalline silicon substrate; polycrystalline thin film photovoltaic applications; real time spectroscopic ellipsometry; rotating-compensator modulation; single crystal; thin film CdTe deposition; Crystallization; Dielectric thin films; Ellipsometry; Magnetic analysis; Photovoltaic systems; Semiconductor films; Silicon; Solar power generation; Spectroscopy; Sputtering;
Conference_Titel :
Photovoltaic Specialists Conference, 2005. Conference Record of the Thirty-first IEEE
Print_ISBN :
0-7803-8707-4
DOI :
10.1109/PVSC.2005.1488169