DocumentCode :
355797
Title :
I-V characteristics of metal-organic film-silicon structure
Author :
Spoutai, Serguei ; Chun, Hui-Gon
Author_Institution :
Dept. of Appl. & Theor. Phys., Novosibirsk State Tech. Univ., Russia
Volume :
2
fYear :
2000
fDate :
2000
Firstpage :
224
Abstract :
Electrical characteristics of the Metal-Organic Film-Semiconductor structures have been investigated. As the top metal electrode Ag was used. As the organic film PTCDA (perylenetetracarboxylic dianhydride) was chosen. The semiconductor was p-type Si. The current-voltage (I-V) and capacitance-voltage (C-V) characteristics in a wide temperature range from 150 K to 300 K were measured. The frequency dependence of the capacitance and transient capacitance measurements-were performed as well. The results show that I-V characteristics are non-linear with the “power” law current dependence under the forward bias and saturation-like behaviour under reverse bias. The activation energy of the reverse current is close to the activation energy of traps
Keywords :
MIS structures; organic compounds; 150 to 300 K; Ag-PTCDA-Si MIS structure; activation energy; capacitance-voltage characteristics; current-voltage characteristics; electrical characteristics; metal-organic film-silicon structure; perylenetetracarboxylic dianhydride; Capacitance measurement; Capacitance-voltage characteristics; Current measurement; Electric variables; Electrodes; Frequency dependence; Frequency measurement; Performance evaluation; Semiconductor films; Temperature distribution;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Science and Technology, 2000. KORUS 2000. Proceedings. The 4th Korea-Russia International Symposium on
Conference_Location :
Ulsan
Print_ISBN :
0-7803-6486-4
Type :
conf
DOI :
10.1109/KORUS.2000.866030
Filename :
866030
Link To Document :
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