• DocumentCode
    3558133
  • Title

    Quasistatic and nonequilibrium phenomena in m.o.s. structures under the influence of a constant gate-current bias

  • Author

    Allman, P.G.C. ; Simmons, J.G.

  • Author_Institution
    University of Toronto, Department of Electrical Engineering, Toronto, Canada
  • Volume
    127
  • Issue
    3
  • fYear
    1980
  • fDate
    6/1/1980 12:00:00 AM
  • Firstpage
    140
  • Lastpage
    146
  • Abstract
    The quasistatic and nonequilibrium response of an m.o.s. system containing bulk traps under constant gate-current conditions is analysed. It is shown that a particular advantage of the method is that the total semiconductor capacitance can be extracted directly from the curves, thus easing the analysis of quasistatic results for obtaining interface state density. For a specific range of operating conditions the resulting nonequilibrium characteristic is rich in structure, which allows for analysis of the bulk properties of the semiconductor.
  • Keywords
    capacitance; electron traps; hole traps; interface electron states; metal-insulator-semiconductor structures; semiconductor device models; C/V characteristics; MOS structures; bulk traps; constant gate current bias; interface state density; nonequilibrium phenomena; quasistatic phenomena; semiconductor capacitance;
  • fLanguage
    English
  • Journal_Title
    Solid-State and Electron Devices, IEE Proceedings I
  • Publisher
    iet
  • Conference_Location
    6/1/1980 12:00:00 AM
  • ISSN
    0143-7100
  • Type

    jour

  • DOI
    10.1049/ip-i-1.1980.0027
  • Filename
    4642493