DocumentCode :
3558156
Title :
Current mechanism of tunnel m.i.s. solar cells
Author :
Nielsen, O.M.
Author_Institution :
Technical University of Denmark, Laboratory for Semiconductor Technology, Lyngby, Denmark
Volume :
127
Issue :
6
fYear :
1980
fDate :
12/1/1980 12:00:00 AM
Firstpage :
301
Lastpage :
307
Abstract :
Dark current/voltage characteristics have been examined as a function of temperature for two structures of A1-pSi m.i.s. solar cells. The solar cells have been prepared with interfacial oxide thickness ranging from 10 Å to 20 Å. The results show that the diode saturation current Jo for all oxide thicknesses behave as a majority-carrier current, highly dependent on the effective metal-to-semiconductor barrier height ÿms and the oxide-tunnel exponent X1/2¿. From the illuminated current/voltage characteristics the sum of ÿms and (KT/q)X1/2¿ is found to be in the range of 730¿1025 mV, increasing with increasing oxide thicknessand acceptor concentration.
Keywords :
aluminium; elemental semiconductors; metal-insulator-semiconductor devices; silicon; silicon compounds; solar cells; Al-SiO2-p-Si MIS solar cells; Schottky barrier devices; acceptor concentration; dark current voltage characteristics; diode saturation current; illuminated current voltage characteristics; interfacial oxide thickness; majority carrier current; metal semiconductor barrier height;
fLanguage :
English
Journal_Title :
Solid-State and Electron Devices, IEE Proceedings I
Publisher :
iet
Conference_Location :
12/1/1980 12:00:00 AM
ISSN :
0143-7100
Type :
jour
DOI :
10.1049/ip-i-1.1980.0059
Filename :
4642528
Link To Document :
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