Title :
Optimum designs for InGaAsP/InP (λ = 1.3μm) planoconvex waveguide lasers under lasing conditions
Author :
Ueno, M. ; Lang, R. ; Matsumoto, S. ; Kawano, H. ; Furuse, T. ; Sakuma, I.
Author_Institution :
Nippon Electric Co. Ltd., Opto-Electronics Research Laboratories, Kawasaki, Japan
fDate :
12/1/1982 12:00:00 AM
Abstract :
Lasing characteristics for 1.3 μm InGaAsP/InP planoconvex waveguide (PCW) lasers were investigated both theoretically and experimentally. Fundamental lateral transverse-mode stability, light-output/ current characteristics, including threshold current and external differential quantum efficiency, and fundamental- mode intensity profiles were investigated up to a high injection-current level by using PCW lasers with individually varying structural design parameters. The experimental results were in good agreement with calculations, which were carried out taking into account carrier outdiffusion along the junction plane and spatial hole burning and their effects on the waveguiding. It was found that a narrow groove width (narrow channel), a relatively large built-in effective refractive index difference and a narrow injection current region width are the main PCW structural design conditions responsible for the high-quality lasing characteristics. The experimental results revealed that high-quality 1.3 μm InGaAsP/InP narrow-channel PCW lasers with 2.5 μm groove width show stable fundamental lateral transverse mode operation up to three times the threshold current, at which 25 m W output power from a facet is attained under CW operation.
Keywords :
III-V semiconductors; gallium arsenide; indium compounds; laser frequency stability; laser modes; semiconductor junction lasers; 1.3 microns wavelength; InGaAsP-InP planoconvex waveguide lasers; built-in effective refractive index difference; carrier outdiffusion; external differential quantum efficiency; fundamental-mode intensity profiles; high injection-current level; lasing conditions; lateral transverse-mode stability; light-output/current characteristics; narrow groove width; narrow injection current region; semiconductor laser; spatial hole burning; threshold current; Semiconductor lasers, Doping, Epitaxy;
Journal_Title :
Solid-State and Electron Devices, IEE Proceedings I
Conference_Location :
12/1/1982 12:00:00 AM
DOI :
10.1049/ip-i-1.1982.0050