• DocumentCode
    3558265
  • Title

    High-density one-device dynamic MOS memory cells

  • Author

    Itoh, Kiyoo ; Sunami, Hideo

  • Author_Institution
    Hitachi Ltd., Central Research Laboratory, Kitatama, Japan
  • Volume
    130
  • Issue
    3
  • fYear
    1983
  • fDate
    6/1/1983 12:00:00 AM
  • Firstpage
    127
  • Lastpage
    135
  • Abstract
    Performance of one-device cells for dynamic random-access memories is described in terms of signal, noise, speed, soft error and process complexity. From an examination of areal layout and cross-section, five kinds of cells used in commercially available 64 Kbit DRAMs are compared, placing stress on the concept of the folded-data and open-data lines. Somes new DRAM cell concepts, such as a vertically structured capacitor, are proposed on the basis of the paper. The future application limit of the one-device cell seems to exist in the optical lithography of the next generation DRAM of 1 Mbit and beyond, not in the device concept itself.
  • Keywords
    field effect integrated circuits; integrated circuit technology; integrated memory circuits; random-access storage; 64K DRAM; MOS memory cells; VLSI; dynamic RAM; folded data lines; memory cell signal; noise; one-device cells; open-data lines; optical lithography; process complexity; random-access memories; soft error; speed; vertically structured capacitor;
  • fLanguage
    English
  • Journal_Title
    Solid-State and Electron Devices, IEE Proceedings I
  • Publisher
    iet
  • Conference_Location
    6/1/1983 12:00:00 AM
  • ISSN
    0143-7100
  • Type

    jour

  • DOI
    10.1049/ip-i-1.1983.0024
  • Filename
    4642693