A 1/4-inch 380 k pixel IT-CCD image sensor employing gate-assisted punchthrough read-out mode

A newly developed 1/4-inch 380 k pixel IT-CCD image sensor features a novel cell structure in which signal charges are read out from a photodiode (PD) to a vertical-CCD (V-CCD) in a gate-assisted punchthrough mode. The cell structure, fabricated through the use of high energy ion implantation technology, enables both deep PD formation and transfer-gate (TG)/channel-stop (CS) length reduction. Deep PD formation helps increase sensitivity per PD unit area, and TG/CS length reduction widens both PD and V-CCD areas. Although the cell size is small (4.8 μm (H)×5.6 μm (V)), the sensor achieves both high sensitivity (35 mV/lx) and a high saturation signal (600 mV).