• DocumentCode
    3559181
  • Title

    Recent advances in high-k nanocomposite materials for embedded capacitor applications

  • Author

    Lu, Jiongxin ; Wong, C.P.

  • Author_Institution
    Sch. of Mater. Sci. & Eng., Georgia Inst. of Technol., Atlanta, GA
  • Volume
    15
  • Issue
    5
  • fYear
    2008
  • fDate
    10/1/2008 12:00:00 AM
  • Firstpage
    1322
  • Lastpage
    1328
  • Abstract
    In this paper, a wide variety of high dielectric constant (k) composite materials which have been developed and evaluated for embedded capacitor application are reviewed. Current research efforts toward achieving high dielectric performance including high-k and low dielectric loss for polymer composites are presented. New insights into the effect of unique properties of the nanoparticle filler, filler modification and the dispersion between filler and polymer matrix on the dielectric properties of the nanocomposites are discussed in details.
  • Keywords
    capacitors; dielectric losses; filled polymers; high-k dielectric thin films; nanocomposites; nanoparticles; dielectric loss; high-k nanocomposite materials; nanoparticle filler; polymer matrix; Capacitors; Composite materials; Dielectric losses; Dispersion; High K dielectric materials; High-K gate dielectrics; Nanocomposites; Nanostructured materials; Performance loss; Polymers; Dielectric materials; capacitors; nanocomposites; nanotechnology;
  • fLanguage
    English
  • Journal_Title
    Dielectrics and Electrical Insulation, IEEE Transactions on
  • Publisher
    ieee
  • Conference_Location
    10/1/2008 12:00:00 AM
  • ISSN
    1070-9878
  • Type

    jour

  • DOI
    10.1109/TDEI.2008.4656240
  • Filename
    4656240