DocumentCode
3559181
Title
Recent advances in high-k nanocomposite materials for embedded capacitor applications
Author
Lu, Jiongxin ; Wong, C.P.
Author_Institution
Sch. of Mater. Sci. & Eng., Georgia Inst. of Technol., Atlanta, GA
Volume
15
Issue
5
fYear
2008
fDate
10/1/2008 12:00:00 AM
Firstpage
1322
Lastpage
1328
Abstract
In this paper, a wide variety of high dielectric constant (k) composite materials which have been developed and evaluated for embedded capacitor application are reviewed. Current research efforts toward achieving high dielectric performance including high-k and low dielectric loss for polymer composites are presented. New insights into the effect of unique properties of the nanoparticle filler, filler modification and the dispersion between filler and polymer matrix on the dielectric properties of the nanocomposites are discussed in details.
Keywords
capacitors; dielectric losses; filled polymers; high-k dielectric thin films; nanocomposites; nanoparticles; dielectric loss; high-k nanocomposite materials; nanoparticle filler; polymer matrix; Capacitors; Composite materials; Dielectric losses; Dispersion; High K dielectric materials; High-K gate dielectrics; Nanocomposites; Nanostructured materials; Performance loss; Polymers; Dielectric materials; capacitors; nanocomposites; nanotechnology;
fLanguage
English
Journal_Title
Dielectrics and Electrical Insulation, IEEE Transactions on
Publisher
ieee
Conference_Location
10/1/2008 12:00:00 AM
ISSN
1070-9878
Type
jour
DOI
10.1109/TDEI.2008.4656240
Filename
4656240
Link To Document