• DocumentCode
    3559224
  • Title

    Influences of Thermal Annealing Temperatures on Irradiation Induced E^{\\prime } Centers in Silica Glass

  • Author

    Wang, Tingyun ; Xiao, Zhongyin ; Luo, Wenyun

  • Author_Institution
    Sch. of Commun. & Inf. Eng., Shanghai Univ., Shanghai
  • Volume
    55
  • Issue
    5
  • fYear
    2008
  • Firstpage
    2685
  • Lastpage
    2688
  • Abstract
    Influences of pre-irradiation and thermal annealing on E ´ defect concentration are studied by measuring E ´ centers and optical absorptions using ESR and spectrophotometer, respectively. The results show that the E ´ defect concentration decreases significantly when silica glass is pre-irradiated by gamma rays and a subsequent thermal annealing. The effect of thermal annealing on the E ´ concentration has also been investigated for the temperature from 300degC to 1300degC. It is found from the ESR spectrum that the anti-irradiated property of the silica glass can be improved when the thermal annealing temperature is larger than 700degC. These results have been proved by optical absorption spectra.
  • Keywords
    annealing; colour centres; gamma-ray effects; glass; paramagnetic resonance; silicon compounds; ESR; SiO2; defect concentration; gamma-ray effect; irradiation induced E centers; optical absorption spectra; optical absorptions; silica glass; spectrophotometer; temperature 300 C to 1300 C; thermal annealing temperatures; Absorption; Annealing; Electron optics; Glass; Optical devices; Optical fibers; Paramagnetic resonance; Silicon compounds; Stimulated emission; Temperature; $gamma$ irradiation; $E^{prime}$ concentration; electron spin resonance; optical absorption; thermal annealing;
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/TNS.2008.2003439
  • Filename
    4696622