DocumentCode
3559224
Title
Influences of Thermal Annealing Temperatures on Irradiation Induced
Centers in Silica Glass
Author
Wang, Tingyun ; Xiao, Zhongyin ; Luo, Wenyun
Author_Institution
Sch. of Commun. & Inf. Eng., Shanghai Univ., Shanghai
Volume
55
Issue
5
fYear
2008
Firstpage
2685
Lastpage
2688
Abstract
Influences of pre-irradiation and thermal annealing on E ´ defect concentration are studied by measuring E ´ centers and optical absorptions using ESR and spectrophotometer, respectively. The results show that the E ´ defect concentration decreases significantly when silica glass is pre-irradiated by gamma rays and a subsequent thermal annealing. The effect of thermal annealing on the E ´ concentration has also been investigated for the temperature from 300degC to 1300degC. It is found from the ESR spectrum that the anti-irradiated property of the silica glass can be improved when the thermal annealing temperature is larger than 700degC. These results have been proved by optical absorption spectra.
Keywords
annealing; colour centres; gamma-ray effects; glass; paramagnetic resonance; silicon compounds; ESR; SiO2; defect concentration; gamma-ray effect; irradiation induced E\´ centers; optical absorption spectra; optical absorptions; silica glass; spectrophotometer; temperature 300 C to 1300 C; thermal annealing temperatures; Absorption; Annealing; Electron optics; Glass; Optical devices; Optical fibers; Paramagnetic resonance; Silicon compounds; Stimulated emission; Temperature; $gamma$ irradiation; $E^{prime}$ concentration; electron spin resonance; optical absorption; thermal annealing;
fLanguage
English
Journal_Title
Nuclear Science, IEEE Transactions on
Publisher
ieee
ISSN
0018-9499
Type
jour
DOI
10.1109/TNS.2008.2003439
Filename
4696622
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