• DocumentCode
    3559414
  • Title

    Effects of Hydrogenation on Optoelectronic Properties of a-C:H Thin-Film White-Light-Emitting Diodes With Composition-Graded Carrier-Injection Layers

  • Author

    Lo, Shih-Yung ; Yeh, Rong-Hwei ; Yu, Tai-Rong ; Hong, Jyh-Wong

  • Author_Institution
    Dept. of Electr. Eng., Nat. Central Univ., Jhongli
  • Volume
    56
  • Issue
    1
  • fYear
    2009
  • Firstpage
    57
  • Lastpage
    64
  • Abstract
    In this paper, thin-film white-light-emitting diodes (TFWLEDs) were fabricated with a hydrogenated intrinsic amorphous carbon (i-a-C:H) film as the luminescent layer and a composition-graded (CG) hydrogenated intrinsic amorphous silicon carbide (i-a-SiC:H) film as the carrier-injection layers. The demonstrated TFWLEDs could be operated under direct-current (dc) forward or reverse bias or sinusoidal alternating-current (ac) voltage. The hydrogenation process for the luminescent or CG carrier-injection layer has been investigated to greatly enhance the optoelectronic properties of the obtained TFWLEDs. For the hydrogenated TFWLEDs, the highest obtainable brightnesses were 813 and 507 cd/m2 at an injection-current density of 0.6 A/cm2, and the lowest electroluminescence (EL) threshold voltages were 9.1 and 8.9 V, under dc forward and reverse biases, respectively. These enhanced optoelectronic properties were attributed to the passivation of dangling bonds and the forming of more H2-compensated amorphous film by the employed hydrogenation process. In addition, the electrical transport mechanisms of the TFWLEDs were studied. In the low-applied-bias range, the ohmic current was the dominated one. In the high-applied-bias range, a Poole-Frenkel emission current resulted from the field-assisted hopping along the traps in amorphous film was observed. Moreover, a significant red-shift in EL spectra has been observed while the applied ac frequencies were higher than 1 kHz, and its origin has been attributed to the lower mobilities of charge carriers.
  • Keywords
    Poole-Frenkel effect; amorphous semiconductors; carbon; carrier mobility; current density; dangling bonds; electroluminescence; electron traps; hole traps; hopping conduction; hydrogen; hydrogenation; light emitting diodes; ohmic contacts; passivation; red shift; semiconductor thin films; silicon compounds; wide band gap semiconductors; Poole-Frenkel emission current; SiC-C:H; TFWLED; a-C:H thin film white light emitting diode; amorphous silicon carbide film; brightnesses; carrier traps; charge carrier mobility; composition-graded carrier injection layer; dangling bond; electroluminescence; field-assisted hopping; hydrogenation; injection current density; intrinsic amorphous carbon film; luminescent layer; ohmic current; optoelectronic property; passivation; red shift; Amorphous materials; Amorphous silicon; Brightness; Character generation; Diodes; Electroluminescence; Semiconductor films; Semiconductor thin films; Transistors; Voltage; Alternating current (ac); carrier-injection layer; composition-graded (CG); direct current (dc); hydrogenated amorphous carbon (a-C:H); hydrogenation; thin-film light-emitting diode (TFLED); white;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • Conference_Location
    12/9/2008 12:00:00 AM
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2008.2008710
  • Filename
    4703297