• DocumentCode
    3559554
  • Title

    Linear Bilayer ALD Coated MEMS Varactor With High Tuning Capacitance Ratio

  • Author

    Bakri-Kassem, Maher ; Mansour, Raafat R.

  • Author_Institution
    Res. & Dev. Dept., MEMSCAP Inc., Durham, NC
  • Volume
    18
  • Issue
    1
  • fYear
    2009
  • Firstpage
    147
  • Lastpage
    153
  • Abstract
    A curl-up-plate microelectromechanical system (MEMS) varactor with an almost linear response and high tuning capacitance ratio is presented. The curl-up in the top plate is realized by the residual stress in the two layers that construct the top plate of the varactor. The linear response is achieved by having the curl-up plate designed to relax on the bottom plate and by having unanchored cantilever beams that prevent the pull-in, while applying a dc bias voltage. The developed varactor exhibits a low parasitic capacitance through etching the lossy substrate underneath the varactor´s plates. A thin alumina dielectric layer of 100-nm thickness is deposited using an atomic-layer-deposition technique to provide electrical isolation between the two plates. This MEMS varactor exhibits an almost linear capacitance with a tuning ratio of 5 : 1.
  • Keywords
    alumina; atomic layer deposition; micromechanical devices; tuning; varactors; Al2O3; atomic-layer-deposition; curl-up-plate microelectromechanical system; dc bias voltage; electrical isolation; high-tuning capacitance ratio; linear bilayer ALD coated MEMS varactor; residual stress; size 100 nm; thin alumina dielectric layer; unanchored cantilever beams; Atomic layer deposition (ALD); RF microelectromechanical system (MEMS); varactors; wet etching;
  • fLanguage
    English
  • Journal_Title
    Microelectromechanical Systems, Journal of
  • Publisher
    ieee
  • Conference_Location
    12/12/2008 12:00:00 AM
  • ISSN
    1057-7157
  • Type

    jour

  • DOI
    10.1109/JMEMS.2008.2008626
  • Filename
    4711133