DocumentCode :
3559554
Title :
Linear Bilayer ALD Coated MEMS Varactor With High Tuning Capacitance Ratio
Author :
Bakri-Kassem, Maher ; Mansour, Raafat R.
Author_Institution :
Res. & Dev. Dept., MEMSCAP Inc., Durham, NC
Volume :
18
Issue :
1
fYear :
2009
Firstpage :
147
Lastpage :
153
Abstract :
A curl-up-plate microelectromechanical system (MEMS) varactor with an almost linear response and high tuning capacitance ratio is presented. The curl-up in the top plate is realized by the residual stress in the two layers that construct the top plate of the varactor. The linear response is achieved by having the curl-up plate designed to relax on the bottom plate and by having unanchored cantilever beams that prevent the pull-in, while applying a dc bias voltage. The developed varactor exhibits a low parasitic capacitance through etching the lossy substrate underneath the varactor´s plates. A thin alumina dielectric layer of 100-nm thickness is deposited using an atomic-layer-deposition technique to provide electrical isolation between the two plates. This MEMS varactor exhibits an almost linear capacitance with a tuning ratio of 5 : 1.
Keywords :
alumina; atomic layer deposition; micromechanical devices; tuning; varactors; Al2O3; atomic-layer-deposition; curl-up-plate microelectromechanical system; dc bias voltage; electrical isolation; high-tuning capacitance ratio; linear bilayer ALD coated MEMS varactor; residual stress; size 100 nm; thin alumina dielectric layer; unanchored cantilever beams; Atomic layer deposition (ALD); RF microelectromechanical system (MEMS); varactors; wet etching;
fLanguage :
English
Journal_Title :
Microelectromechanical Systems, Journal of
Publisher :
ieee
Conference_Location :
12/12/2008 12:00:00 AM
ISSN :
1057-7157
Type :
jour
DOI :
10.1109/JMEMS.2008.2008626
Filename :
4711133
Link To Document :
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