DocumentCode
3559996
Title
Effect of Planarization on the Contact Behavior of Patterned Media
Author
Nunez, Emerson Escobar ; Yeo, Chang-Dong ; Katta, Raja R. ; Polycarpou, Andreas A.
Author_Institution
Univ. of Illinois at Urbana-Champaign, Urbana, IL
Volume
44
Issue
11
fYear
2008
Firstpage
3667
Lastpage
3670
Abstract
The contact behavior of patterned media was examined using a 2-D plane strain finite-element model. The maximum stresses always occurred on the lower right corner of the pattern at the edge of the contact. The effects of planarization on the resulting contact stresses for different filling materials were compared. Using a filling material resulted in a decrease of the contact stresses in the patterns since it not only made the media more robust, but it also helped in relieving the contact load on the top of the patterns. In comparing harder and softer filling materials, it was found that harder materials offer a slight advantage in alleviating the stresses.
Keywords
finite element analysis; magnetic recording; 2-D plane strain finite-element model; contact behavior; filling material; magnetic recording; patterned media; planarization; Contacts; finite-element analysis (FEA); magnetic recording; patterned media; planarization;
fLanguage
English
Journal_Title
Magnetics, IEEE Transactions on
Publisher
ieee
ISSN
0018-9464
Type
jour
DOI
10.1109/TMAG.2008.2002593
Filename
4717328
Link To Document