• DocumentCode
    3560179
  • Title

    Texture Effects in IrMn/CoFe Exchange Bias Systems

  • Author

    Aley, N.P. ; Vallejo-Fernandez, G. ; Kroeger, R. ; Lafferty, B. ; Agnew, J. ; Lu, Y. ; O´Grady, K.

  • Author_Institution
    Dept. of Phys., Univ. of York, York
  • Volume
    44
  • Issue
    11
  • fYear
    2008
  • Firstpage
    2820
  • Lastpage
    2823
  • Abstract
    We report an enhancement of the average blocking temperature <TB> in IrMn/CoFe exchange bias systems due to an increase in the anisotropy constant of the IrMn. This is related to a (111) texture of IrMn parallel to the interface. Si<100>/Seed (5 nm)/IrMn (10 nm)/CoFe (3 nm)/Ta (10 nm) were prepared by dc sputtering. Cu, Ru, and NiCr seed layers were used. X-ray diffraction studies involving both thetas/2thetas and grazing incidence scans revealed a strong (111) texture of the IrMn parallel to the interface for the samples with a NiCr seed layer. Cu and Ru seed layers did not cause a marked texture. Thermal activation measurements found an enhancement of the average blocking temperature from 367 K for the sample with Cu seed layer to 477 K for the sample with a NiCr seed. The anisotropy constant was found to increase from (2.8plusmn0.2) times 106 erg/cm3 for the sample with a Cu seed layer to (3.3 plusmn 0.4) times 107 erg/cm3 for the sample with a NiCr seed layer. We find that the increase in the anisotropy constant leads to an enhanced blocking temperature.
  • Keywords
    X-ray diffraction; antiferromagnetic materials; chromium alloys; cobalt alloys; copper; exchange interactions (electron); interface magnetism; iridium alloys; iron alloys; magnetic anisotropy; magnetic thin films; manganese alloys; nickel alloys; ruthenium; silicon; tantalum; texture; tunnelling magnetoresistance; Si-IrMn-CoFe-Ta-Cu; Si-IrMn-CoFe-Ta-NiCr; Si-IrMn-CoFe-Ta-Ru; X-ray diffraction; anisotropy constant; antiferromagnetic layer; average blocking temperature; dc sputtering; exchange bias systems; grazing incidence; seed layers; temperature 367 K to 477 K; texture effects; thermal activation; tunneling magnetoresistance; Anisotropy; IrMn; exchange bias; thermal activation;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/TMAG.2008.2001317
  • Filename
    4717523