DocumentCode :
3560369
Title :
Study on Absence of Room-Temperature Ferromagnetism in the Mn-AlN Films With Various Mn Concentrations
Author :
Sato, Takanobu ; Endo, Yasushi ; Kawamura, Yoshio ; Kirino, Fumiyoshi ; Nakatani, Ryoichi ; Yamamoto, Masahiko
Author_Institution :
Dept. of Mater. Sci. & Eng., Osaka Univ., Suita
Volume :
44
Issue :
11
fYear :
2008
Firstpage :
2688
Lastpage :
2691
Abstract :
We have investigated the magnetic behavior and structure of polycrystalline Mn-AlN (Al1-xMnxN) films with various Mn concentrations (x= 0.05-0.24) fabricated by reactive direct current (dc) magnetron sputtering. The magnetic behavior of these films depends on the Mn concentration x. The films with x=0.05-0.10 show a paramagnetic behavior at 10-300 K. The film with x=0.17 shows remanent magnetization and coercivity only at 10 K, while that with x=0.24 shows an unknown magnetic behavior. Only wurtzite-type AlN phase is observed for x below 0.10. The coexistence of a wurtzite-type AlN phase and a secondary phase such as Al-Mn alloy, Mn-nitride, or Al-Mn-N ternary compound is observed for x= 0.17. The coexistence of a wurtzite-type AlN phase and a ThH2-type Mn3N2 phase is observed for x=0.24. From these results, it is concluded that the Al1-xMnxN films do not exhibit room-temperature (RT) ferromagnetism for all x . Moreover, it is likely that the ferromagnetic behavior observed at 10 K for x=0.17 is caused by the secondary phase.
Keywords :
III-V semiconductors; aluminium compounds; coercive force; ferromagnetic materials; magnetic thin films; paramagnetic materials; paramagnetism; remanence; semimagnetic semiconductors; sputtered coatings; wide band gap semiconductors; Al1-xMnxN; coercivity; ferromagnetism; paramagnetic behavior; polycrystalline films; reactive direct current magnetron sputtering; remanent magnetization; temperature 10 K to 300 K; wurtzite-type phase; Magnetic semiconductors; Mn-AlN films; paramagnetic behavior; room-temperature (RT) ferromagnetism;
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/TMAG.2008.2002366
Filename :
4717732
Link To Document :
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