DocumentCode
3560438
Title
Focused MOKE Study of Self-Assembly Nanoscale Fe
Ni
Dot Arrays
Author
Niu, D.X. ; Zou, X. ; Wu, J. ; Xu, Y.B.
Author_Institution
Dept. of Electron., Univ. of York, York
Volume
44
Issue
11
fYear
2008
Firstpage
2749
Lastpage
2752
Abstract
Using nanosphere lithography (NSL) technique, we have fabricated well defined triangular shaped Fe64Ni36 dot arrays with feature size down to 30 nm on silicon substrate. In-plane focused magneto-optical Kerr effect (MOKE) measurements show that these nanoscale dot arrays have an enhanced coercivity of around 200 Oe compared with that of the continuous thin film of 50 Oe. In combining with micromagnetic calculations, we found that the magnetization process follows two steps, the rotation of the top corner and then a switching of the bottom base, which controls the coercivity of the dots.
Keywords
Kerr magneto-optical effect; coercive force; ferromagnetic materials; iron alloys; magnetic switching; micromagnetics; nanolithography; nanostructured materials; nickel alloys; self-assembly; silicon; Fe64Ni36-Si; Si; coercivity; in-plane focused magneto-optical Kerr effect; magnetic switching; magnetization; micromagnetic calculations; nanosphere lithography technique; self-assembly nanoscale dot arrays; silicon substrate; size 30 nm; Dot arrays; enhanced coercivity; local shape anisotropy; nanosphere lithography; self-assembly;
fLanguage
English
Journal_Title
Magnetics, IEEE Transactions on
Publisher
ieee
ISSN
0018-9464
Type
jour
DOI
10.1109/TMAG.2008.2001333
Filename
4717806
Link To Document