DocumentCode
3560561
Title
Toward a Germanium Laser for Integrated Silicon Photonics
Author
Sun, Xiaochen ; Liu, Jifeng ; Kimerling, Lionel C. ; Michel, Jurgen
Author_Institution
Microphotnics Center, Massachusetts Inst. of Technol., Cambridge, MA, USA
Volume
16
Issue
1
fYear
2010
Firstpage
124
Lastpage
131
Abstract
It has been demonstrated theoretically and experimentally that germanium, with proper strain engineering and n-type doping, can be an efficient light emitter and a gain medium at its direct bandgap within the third optical communication window ( ~1520-1620 nm). In this paper, we systematically discuss the effect of strain, doping, and temperature on the direct-gap optical gain in germanium. For electrically pumped devices, properties and design guidelines of Ge/Si heterojunction are also analyzed and compared with the results from fabricated Ge/Si heterojunction LEDs.
Keywords
amplification; germanium; integrated optoelectronics; light emitting diodes; optical communication equipment; semiconductor doping; semiconductor lasers; silicon; thermal stresses; Ge-Si; direct gap optical gain; germanium laser; integrated silicon photonics; optical communication; semiconductor doping; semiconductor heterojunction; Integrated optoelectronics; light emitters; silicon photonics;
fLanguage
English
Journal_Title
Selected Topics in Quantum Electronics, IEEE Journal of
Publisher
ieee
Conference_Location
10/13/2009 12:00:00 AM
ISSN
1077-260X
Type
jour
DOI
10.1109/JSTQE.2009.2027445
Filename
5286843
Link To Document