DocumentCode :
3560729
Title :
Comparison of Methods to Bias Fully Depleted SOI-Based MOSFET Nanoribbon pH Sensors
Author :
Chapman, Richard A. ; Fernandes, Poornika G. ; Seitz, Oliver ; Stiegler, Harvey J. ; Wen, Huang-Chun ; Chabal, Yves J. ; Vogel, Eric M.
Author_Institution :
Univ. of Texas at Dallas, Richardson, TX, USA
Volume :
58
Issue :
6
fYear :
2011
fDate :
6/1/2011 12:00:00 AM
Firstpage :
1752
Lastpage :
1760
Abstract :
The potential and electric field boundary conditions for the Gouy-Chapman model of the electrolyte diffuse layer are used to properly couple the potentials in the silicon-on-insulator-based metal-oxide-semiconductor field-effect transistor to the electrolyte. This analysis is possible because the active silicon channel is fully depleted. Both the subthreshold and linear regimes are simulated. An operation with electrolyte floating and bias applied to the substrate is compared with the other methods of biasing the sensor.
Keywords :
MOSFET; chemical sensors; electrolytes; nanostructured materials; pH measurement; silicon-on-insulator; Gouy-Chapman model; bias fully depleted SOI-based MOSFET nanoribbon pH sensors; electric field boundary condition; electrolyte diffuse layer; electrolyte floating; silicon channel; silicon-on-insulator-based metal-oxide-semiconductor field-effect transistor; Electric potential; Insulators; Logic gates; MOSFET circuits; Sensors; Silicon; Substrates; Capacitive coupling; floating gate; fully depleted silicon-on-insulator (SOI); ion-sensitive field-effect transistor (ISFET); pH sensor;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
Conference_Location :
4/29/2011 12:00:00 AM
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2011.2132134
Filename :
5759075
Link To Document :
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