DocumentCode
3560868
Title
Time-Resolved Electron Energy Distributions and Plasma Characteristics in a Pulsed Capacitively Coupled Plasma
Author
Song, Sang-Heon ; Kushner, Mark J.
Author_Institution
Dept. of Nucl. Eng. & Radiol. Sci., Univ. of Michigan, Ann Arbor, MI, USA
Volume
39
Issue
11
fYear
2011
Firstpage
2542
Lastpage
2543
Abstract
Pulsed capacitively coupled plasmas (CCPs) are attractive for controlling electron energy distributions f(ε) and plasma properties for microelectronic fabrication. A conceptual design of a pulsed CCP is discussed which provides additional control over the magnitude and composition of the reactive fluxes to the wafer. We present computed images of time-resolved f(ε) and electron density during a pulse period.
Keywords
ionisation; plasma density; plasma flow; plasma simulation; sputter etching; electron density; microelectronic fabrication; plasma characteristics; plasma properties; pulsed capacitively coupled plasma; reactive fluxes; time resolved density; time resolved electron energy distributions; Etching; Heating; Inductors; Ionization; Mathematical model; Plasma properties; Electron energy distribution; plasma simulation; pulsed plasma;
fLanguage
English
Journal_Title
Plasma Science, IEEE Transactions on
Publisher
ieee
Conference_Location
5/2/2011 12:00:00 AM
ISSN
0093-3813
Type
jour
DOI
10.1109/TPS.2011.2132743
Filename
5762369
Link To Document