DocumentCode
3561374
Title
Wettability of Amorphous Diamond-Like Carbons Deposited on Si and PMMA in Pulse-Modulated Plasmas
Author
Sung, Ta-Lun ; Yang, Jason Hsiao-Chun ; Teii, Kungen ; Teii, Shinriki ; Liu, Chung-Ming ; Tseng, Wan-Yu ; Lin, Li-Deh ; Ono, Shigeru
Author_Institution
Dept. of Chem. & Mater. Eng., Lunghwa Univ. of Sci. & Technol., Taoyuan, Taiwan
Volume
40
Issue
7
fYear
2012
fDate
7/1/2012 12:00:00 AM
Firstpage
1837
Lastpage
1842
Abstract
Pulse-modulated direct-current methane plasmas are used to deposit amorphous diamond-like carbon films on Si and dentistry-use polymethyl methacrylate (PMMA) substrates as a function of the negative pulse voltage applied to the substrate (Vmax). The films on PMMA show a transition from diamond-like to more graphitic carbon in the Raman spectra with increasing Vmax, dissimilar to those on Si. This is attributed to easy deformation of PMMA, leading to the low compressive stress of the films (1 to 2 GPa). The contact angle of water for the films on both Si and PMMA is large, ranging from 79° to 94° almost independent of Vmax, confirming that the films are hydrophobic despite the difference in carbon bonding state. The large dispersion component (41-43 mJ/m2) of the surface free energy of the films measured from the contact angle of water and 1-bromonaphthalene indicates the high mass density of the films. The small polar component (0.2-3.5 mJ/m2) is attributed to hydrogen saturation of the surface sites forming nonpolar C-H bonds and, thus, responsible for the hydrophobic behavior.
Keywords
Raman spectra; amorphous state; bonds (chemical); compressive strength; contact angle; deformation; diamond-like carbon; disperse systems; free energy; hydrophobicity; plasma deposition; surface energy; thin films; wetting; 1-bromonaphthalene; C; PMMA deformation; Raman spectra; Si; Si substrate; amorphous diamond-like carbon film deposition; carbon bonding state; compressive stress; contact angle; dentistry-use polymethyl methacrylate substrate; dispersion component; film transition; graphitic carbon films; hydrogen saturation; hydrophobic films; mass density; negative pulse voltage; nonpolar C-H bonds; polar component; pulse-modulated direct-current methane plasmas; surface free energy; surface sites; wettability; Carbon; Diamond-like carbon; Plasmas; Rough surfaces; Silicon; Substrates; Surface roughness; Amorphous carbon; biomedical coating; chemical vapor deposition (CVD); diamond-like carbon (DLC); optical emission; polymethyl methacrylate (PMMA); pulse; wettability;
fLanguage
English
Journal_Title
Plasma Science, IEEE Transactions on
Publisher
ieee
Conference_Location
5/23/2012 12:00:00 AM
ISSN
0093-3813
Type
jour
DOI
10.1109/TPS.2012.2196057
Filename
6204101
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